For wafers and masks.
Two independent light sources.
Software support for defect documentation.

Four-axis system (rotation, spin, inclination, flip).
Position can be conveniently controlled via joystick or by software command.
Four point PEEK edge-gripper guarantees minimum contamination.
Minimum grip area leaves almost 100% of front and back side of wafer available for inspection.
Maximum handling safety: Closed gripper is mandatory for any movement; wafer handling takes place in dedicated transfer positions only.
In less than 3 seconds the wafer is flipped to it's reverse side.

Homogenous brightfield illumination of full wafer area using a fluorescence lamp array.
Superbright darkfield illumination with high-power LEDs.
Long service life of up to 20.000 hours continuous operation keep cost of ownership low.
Resist wafers are protected by using colour filters. Filters can be removed for white-light illumination in OQA.
Recipe-adjustable illumination settings allow to adapt wafer position, side, contrast mode and brightness to inspection task.

Standard configuration works with 200 mm, 300 mm or 450 mm wafers.
Adapter kit available for conversion from 200 mm to 150 mm. Can be easily exchanged in the field by average trained  personnel.
Macro station is available for sample thickness from ~250 microns to >3 mm.
Sample weight can be as much as 600g.
Mask inspection possible by modified gripper arm.
Adaptation to any other sample (round, rectangular, odd-shaped) is no problem.